|
Major capability parameter | |||
|
Growth method |
Czochralski method | ||
|
Crystal structure |
M3 | ||
|
Unit cell constant |
a=b=5.148Å c=13.863 Å | ||
|
Melt point（℃） |
1250 | ||
|
Density（g/cm3） |
4.64 | ||
|
Hardness |
5（mohs） | ||
|
Through scope |
0.4-2.9um | ||
|
Index of refraction |
no=2.286 ne=2.203 （632.8nm） | ||
|
Nonlinear coefficient |
d33=34.45，d31=d15=5.95，d22=13.07 （pmv-1） | ||
|
Denko coefficient |
γ13=8.6，γ22=3.4，γ33=30.8，γ51=28.0，γ22=6.00（pmv-1） | ||
|
Through scope |
370～5000nm >68% （632.8nm） | ||
|
Thermal expansion |
a11=15.4×10-6/k，a33=7.5×10-6/k | ||
|
Product specification | |||
|
Size |
<Ø3″ |
Surface quality |
10/5 |
|
Size tolerances |
Z： ±0.3mm X、Y：±0.1mm |
Plane degrees |
v8 （632.8nm） |
|
Rotating angles |
小于0.5mm，45 º±5 º |
coating film |
R<0.2%（1064nm） |
|
Precision |
Z： 5′ X、Y：<10′ |
distorted |
<N4（633nm） |
|
Pack |
100 clean bag，1000 exactly clean bag | ||