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Home / 晶体产品 / 薄膜衬底 / GaN 薄膜基片

薄膜衬底

Home / 晶体产品 / 薄膜衬底 / GaN 薄膜基片 / 氮化镓(GaN)
氮化镓(GaN)

薄膜衬底

产品型号Item
GaN-FS-10
GaN-FS-15
尺寸Dimensions
10.0mm×10.5mm
14.0mm×15.0mm
孔洞密度Marco Defect Density
A Level
0 cm-2
B Level
≤ 2 cm-2
厚度Thickness
Rank 300
300 ± 25 µm
Rank 350
350 ± 25 µm
Rank 400
400 ± 25 µm
晶体取向Orientation
C-axis(0001) ± 0.5°
TTV(Total Thickness Variation)
≤15 µm
弯曲度BOW
≤20 µm
导电类型Conduction Type
N-type
Semi-Insulating
电阻率Resistivity(300K)
< 0.5 Ω·cm
>106 Ω·cm
位错密度Dislocation Density
Less than 5x106 cm-2
有效面积Useable Surface Area
> 90%
抛光Polishing
Front Surface: Ra < 0.2nm. Epi-ready polished
Back Surface: Fine ground
包装Package
Packaged in a class 100 clean room environment, in single wafer containers, under a nitrogen atmosphere.